See all Polishing solutions families

HK – Diamond slurries

HK Series of Diamond Slurry is optimized for lapping GaN and SiC wafer.

Ask for information

Products characteristics

Standart products
(Typical calues)		 HK-2000P1 HK-250M1 HK-100T1
Slurry base Water Emulsion Oil
Diamond type Polycrystalline Monocrystalline Heat Treated Monocrystalline

Diamond SEM Pictures

Resources

  • HK Technical Data Sheet

Main applications

CMP - GaN/SiC lapping & polishing

CMP - GaN/SiC lapping & polishing

Related series

A125 – 4N γ alumina unground powder

an unground powder when control of the specific surface area and...
See this product

BA – 4N alumina nanosized unground powder range

BA15, BA20, BA100 & BA105 unground offer control of the specific...
See this product

BRA105 – 4N 93% γ alumina milled powder

This deagglomerated powder can contain upon request 0,1% to 12% of...
See this product

CR – 4N alumina milled powder range

CR1, CR6, CR10, CR15, CR30F, CR125, CRA6 milled powders offer...
See this product
In order to Download files, please login or create an account

Login

I forgot my password

Create an account

Register form

I forget my password
Thank you for your registration !

You can now log in

I forget my password

A message will be sent to your email address.